| [1] | CAI W Q,LI C W,HUO Y S,et al.Atom lithograph[J].Acta Physica Sinica,1999,48(4):611-619(in Chinese). |
| [2] | LI T B.Nanometrology and transfer standard[J].Shanghai Measurement and Testing,2005,32(1):8-13(in Chinese). |
| [3] | ANDERSON W R,BRADLEY C C,McCLELLAND J J,et al.Minimizing feature width in atom optically fabricated chromium nanostructures[J].Physical Review,1999,A59(3):2476-2485. |
| [4] | ZHANG W T,ZHU B H,HUANG J,et al.Chromium atom deposition in elliptical standing wave field[J].Acta Physica Sinica,2011, 60(10):103203/1-103203/5(in Chinese). |
| [5] | ZHANG W T,ZHU B H,XIONG X M,et al.Characteristics of deposition for neutral atoms in laser standing wave with different velocities[J].Acta Physica Sinica,2011,60(6):063202/1-063202/5(in Chinese). |
| [6] | ZHANG W T,ZHU B H,XIONG X M.The research of motorial characteristic of sodium atoms in standing wave field[J].Acta Physica Sinica,2011,60(3):033201(in Chinese). |
| [7] | ZHANG P P,MA Y,ZHANG B W,et al.Properties of 3-D nanostructures fabricated by laser-focused Cr atomic deposition[J].Acta Optica Sinica,2011,31(11):190-194(in Chinese). |
| [8] | ZHANG P P,MA Y,LI T B.Optimization of particle optics model for one-dimensional atom lithography[J].Acta Physica Sinica,2011, 31(5):158-162(in Chinese). |
| [9] | ZHANG B W,MA Y,ZHAO M,et al.3-D simulation of nano-grating by Cr atom beam deposition[J].Laser Technology,2011,35(3): 364-367(in Chinese). |
| [10] | ZHANG W T,ZHU B H.A novel method to realize the nanometer scale grid deposition[J].Acta Physica Sinica,2010,59(8): 5392-5396(in Chinese). |
| [11] | LU X D,LI T B,MA Y,et al.Investigation of atom-optical properties of laser focused Cr atomic deposition[J].Acta Physica Sinica, 2009,58(12):8205-8211(in hinese). |
| [12] | MA Y,LI T B,WU W,et al.Laser-focused atomic deposition for nanoscale grating[J].Chinese Physics Letters,2011,28(7): 073202/1-073202/3. |
| [13] | YU D Y,TAN H Y.Engineering optics[M].3th ed.Beijing:China Machine Press,2011:6,378-384(in Chinese). |