193nm薄膜激光诱导损伤研究

常艳贺; 金春水; 邓文渊; 李春

doi:10.3969/j.issn.1001-3806.2011.03.006

193nm薄膜激光诱导损伤研究

1.
中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室, 长春 130033;
2.
中国科学院研究生院, 北京 100039

作者简介: 常艳贺(1982-),男,硕士研究生,主要从事193nm薄膜技术的研究。.

通讯作者: 金春水, Jin_chunshui@yahoo.com.cn ;

中图分类号: O484

Study on laser induced damage of coating at 193nm

1.
State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China;
2.
Graduate University, Chinese Academy of Sciences, Beijing 100039, China

Corresponding author: JIN Chun-shui, Jin_chunshui@yahoo.com.cn ;

CLC number: O484

摘要: 概述了193nm薄膜激光诱导损伤的研究进展。通过对紫外到深紫外波段几种典型薄膜损伤形貌的介绍,对比分析了193nm薄膜激光诱导损伤的可能原因。指出在该波段的氧化物薄膜损伤中,吸收是导致薄膜大块损伤的重要因素,而氟化物的薄膜损伤则是由沉积过程的膜层局部缺陷造成。根据薄膜样品的损伤分析表明,薄膜的某些制备参量与激光损伤阈值相关联。为提高薄膜元件的抗激光损伤能力,分别从薄膜材料的选择、膜系设计的完善以及沉积工艺的优化等3个方面出发,总结出改善薄膜激光损伤阈值的方法。
- 薄膜 /
- 193nm /
- 损伤形貌 /
- 激光损伤阈值
Abstract: Research progress of laser induced damage of coating at 193nm was reviewed. After some typical damage morphologies from UV to DUV were compared, the possible reasons for the laser damage of the coating were put forward. The absorption of oxide coating at 193nm was responsible for the massive damage, while the damage of fluoride coating at 193nm was induced by local deposit defects. The dependence of the laser induced damage threshold on the thin film preparation parameters was known according to the damage analysis of the specimen. The methods to enhance the laser induced damage threshold were summarized by material chose, coating design and deposition process.
- thin films /
- 193nm /
- damage morphology /
- laser induced damage threshold

[1]	SONG D Y. Research status of deep ultraviolet lithography with 193nm excimer laser[J]. Laser Technology,1999,23(5):288-291(in Chinese).
[2]	XIE Ch Q,YE T Ch. 193nm optical lithography technique[J]. Microelectronic Technology,1999,27(4):9-12(in Chinese).
[3]	FAN Zh X,WEI Ch Y. Progress and development trends of optical coatings in high power laser[J]. Laser & Optoelectronics Progress,2009(7):14-17(in Chinese).
[4]	ULLMANN J,LAUTH H,MANN K,et al. Coated optics for DUV-excimer laser application[J]. SPIE,2000,3902:514-527.
[5]	SHANG Sh Zh,SHAO J D,FAN Zh X. Design of low loss 193nm HR mirror[J]. Optics and Precision Engineering,2008,16(3):392-397(in Chinese).
[6]	SHANG Sh Zh,SHAO J D,FAN Zh X. Low-loss 193nm anti-refection coatings[J]. Acta Physica Sinica,2008,57(3):1946-1950(in Chinese).
[7]	BECKER J,BERNHARDT A. ISO 11254,an international standard for the determination of the laser induced damage threshold[J]. SPIE,1994,2114:703-713.
[8]	ZHU Y N. Discussion of the measurement methods for laser induced damage threshold of optical coating[J]. Laser Technology,2006,30(5):532-535(in Chinese).
[9]	MANN K,LEINHOS U,SCHAFER B. Characterization of absorption losses in deep UV optical materials[J]. Proceedings of SPIE,2007,6403:64031J/1-64031J/10.
[10]	THIELSCH R,HEBER J,UHLIG H,et al. Optical,structural,and mechanical properties of gadolinium trifluoride thin films grown on amorphous substrates[J]. SPIE,2005,5963:211-222.
[11]	HEBER J,THIELSCH R,BLASCHKE H,et al. Stability of optical interference coatings exposed to low-fluence 193nm ArF radiation[J]. SPIE,1998,3334:1041-1047.
[12]	MIREILLE C,YVES N J,LAURENT G,et al. Optical characterization in laser damage studies[J]. Proceedings of SPIE,2007,6403:64031D/1-64031D/15.
[13]	DIJON J,QUESNEL E,PELLE C,et al. Laser damage of optical coating from UV to deep UV at 193nm[J]. SPIE,1998,3578:54-63.
[14]	APEL O,MANN K,THIELSCH R. Nonlinear absorption phenomena in oxide coatings for 193nm[J]. SPIE,2000,3902:235-241.
[15]	GUNSTER S,BLASCHKE H,RISTAU D. Laser resistivity of selected multilayer designs for DUV/VUV applications[J]. SPIE,2007,6403:640318/1-640318/8.
[16]	ZHANG D W,HE H B,SHAO J D,et al. Preparation of high power laser films based on ion beam assisted deposition[J]. Laser Technology,2008,32(1):57-60(in Chinese).
[17]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Microstructure of magnesium fluoride films deposited by boat evaporation at 193nm[J]. Applied Optics,2006,45(28):7319-7324.
[18]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Microstructure-related properties at 193nm of MgF2 and GdF3 films deposited by a resistive-heating boat[J]. Applied Optics,2006,45(7):1368-1374.
[19]	THIELSCH R,HEBER J,KAISER N. Critical issues on the assessment of laser induced damage thresholds of fluoride multilayer coatings at 193nm[J]. SPIE,2000,3902:224-234.
[20]	ZHAO Q,FAN Zh X. Damage mechanism of optical coatings and laser induced damage threshold of improvement[J]. Progress in High Power Laser Technology,1995,21(5):44-48(in Chinese).
[21]	RISTAU D,GUNSTER S,BOSCH S,et al. Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation[J]. Applied Optics,2002,41(16):3196-3204.
[22]	UHLIG H,THIELSCH R,HEBER J,et al. Lanthanide tri-fluorides:a survey of the optical,mechanical and structural properties of thin films with emphasis of their use in the DUV-VUV-spectral range[J]. Proceedings of SPIE,2005,5963:59630N/1-59630N/12.
[23]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Characterization of AlF3 thin films at 193nm by thermal evaporation[J]. Applied Optics,2005,44(34):7333-7338.
[24]	BISCHOFF M,GABLER D,KAISER N,et al. Optical and structural properties of LaF3 thin films[J]. Applied Optics,2008,47(13):157-161.
[25]	ABROMAVICIUS G,BUZELIS R,DRAZDYS R,et al. Influence of electric field distribution on laser induced damage threshold and morphology of high reflectance optical coatings[J]. SPIE,2007,6720:67200Y/1-67200Y/8.
[26]	GOTZELMAMM R,HAGEDORN H,ZOLLER A,et al. Oxide and fluoride coatings for the excimer wavelength 193nm[J]. Proceedings of SPIE,2005,5963:59630L/1-59630L/7.
[27]	BLASCHKE H,LAPPSCHIES M,RISTAU D. Performance enhancement of ion beam sputtered oxide coatings for 193nm[J]. Proceedings of SPIE,2008,6720:67200T/1-67200T/10.
[28]	TIAN J L,SHEN L,ZHANG Y D,et al. Research progress of deep-ultraviolet optical coatings[J]. Laser & Optoelectronics Progress,2009(3):50-56(in Chinese).
[29]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Microstructure and composition related characteristics of LaF3 thin films at 193nm[J]. Optical Engineering,2006,45(8):0838011-0838016.
[30]	TAKI Y. Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography[J]. Vacuum,2004,74(3/4):431-435.

[1]	张大伟 , 贺洪波 , 邵建达 , 范正修 . 离子束辅助沉积制备高功率激光薄膜的研究. 激光技术, 2008, 32(1): 57-60.
[2]	马孜 , 吕百达 , 肖琦 . 近阈值能量密度下薄膜的激光损伤特点. 激光技术, 2000, 24(3): 145-147.
[3]	姜珊珊 , 蔡继兴 , 金光勇 , 苑博识 . 毫秒/纳秒激光致碳纤维环氧树脂损伤形貌研究. 激光技术, 2018, 42(6): 775-779. doi: 10.7510/jgjs.issn.1001-3806.2018.06.009
[4]	李玉瑶 , 王菲 , 孙同同 . 薄膜激光损伤阈值标定技术. 激光技术, 2021, 45(6): 729-734. doi: 10.7510/jgjs.issn.1001-3806.2021.06.009
[5]	吕雪明 , 李泽文 , 张检民 , 倪晓武 . 不同延时的组合脉冲激光致硅表面损伤研究. 激光技术, 2020, 44(6): 695-699. doi: 10.7510/jgjs.issn.1001-3806.2020.06.008
[6]	苗心向 , 袁晓东 , 程晓锋 , 贺少勃 , 郑万国 . 表面污染物诱导熔石英损伤的热力学数值模拟. 激光技术, 2011, 35(2): 285-288. doi: 10.3969/j.issn.1001-3806.2011.02.039
[7]	王瑞华 , 刘训民 , 祝俐 , 何京良 . KTP倍频晶体增透膜的改进. 激光技术, 2009, 33(3): 249-251.
[8]	何长涛 , 马孜 , 陈建国 , 赵汝进 . 基于小波变换的薄膜激光损伤识别. 激光技术, 2007, 31(2): 131-133,136.
[9]	常艳贺 , 金春水 , 李春 , 邓文渊 , 靳京城 . ArF准分子激光对氟化物高反射薄膜的诱导损伤. 激光技术, 2014, 38(3): 302-306. doi: 10.7510/jgjs.issn.1001-3806.2014.03.004
[10]	李玉瑶 , 张婉怡 , 刘喆 , 李美萱 , 付秀华 . S-on-1测量方式下薄膜激光损伤的累积效应. 激光技术, 2018, 42(1): 39-42. doi: 10.7510/jgjs.issn.1001-3806.2018.01.008
[11]	周维军 , 袁永华 , 桂元珍 . 激光辐照TiO2/SiO2薄膜损伤时间简捷测量. 激光技术, 2007, 31(4): 381-383.
[12]	周维军 , 袁永华 , 张大勇 , 桂元珍 , 江继军 . 1.06μm连续激光辐照TiO2/SiO2薄膜元件的损伤效应研究. 激光技术, 2006, 30(1): 76-77,81.
[13]	戴罡 , 陆建 , 王斌 , 刘剑 , 倪晓武 . 脉宽1ms和10ns的激光损伤光学薄膜元件的比较分析. 激光技术, 2011, 35(4): 477-480,542. doi: 10.3969/j.issn.1001-3806.2011.04.010
[14]	王云萍 , 侯军燕 , 袁春 , 康文运 , 陈安民 , 张鲁薇 . 飞秒激光对多光谱滤波片的损伤阈值研究. 激光技术, 2022, 46(5): 697-701. doi: 10.7510/jgjs.issn.1001-3806.2022.05.020
[15]	王成 , 马莹 , 张贵彦 , 肖孟超 , 甘志宏 , 缪同群 , 钱龙生 . 薄膜应力激光测量方法分析. 激光技术, 2005, 29(1): 98-100.
[16]	雷洁红 , 段涛 , 闫正洲 , 邢丕峰 . 沉积条件对氢化锂薄膜形貌和沉积速率的影响. 激光技术, 2011, 35(4): 535-538. doi: 10.3969/j.issn.1001-3806.2011.04.023
[17]	陈传忠 , 姚书山 , 包全合 , 张亮 , 雷廷权 . 脉冲激光沉积羟基磷灰石薄膜的研究现状. 激光技术, 2004, 28(1): 74-77.
[18]	崔文东 , 张鹏翔 , 刘翔 , 张国勇 , 谈松林 , 戴永年 . 巨磁阻薄膜激光感生电压的温度稳定性研究. 激光技术, 2007, 31(6): 636-638.
[19]	刘国芳 , 高传玉 , 杨晓红 , 马明 , 李奇军 . 激光驱动飞片加载下基体/薄膜层裂微成形研究. 激光技术, 2012, 36(3): 298-300.
[20]	陈俊领 , 段国平 , 黄明举 . 激光能量对沉积纳米Si薄膜晶粒尺寸的影响. 激光技术, 2012, 36(3): 322-325.

点击查看大图

计量

文章访问数: 5288
HTML全文浏览量: 612
PDF下载量: 418
被引次数: 0

姓名
邮箱
手机号码
标题
留言内容
验证码

留言板

193nm薄膜激光诱导损伤研究

作者简介: 常艳贺(1982-),男,硕士研究生,主要从事193nm薄膜技术的研究。.

通讯作者: 金春水, Jin_chunshui@yahoo.com.cn ;

Study on laser induced damage of coating at 193nm

Corresponding author: JIN Chun-shui, Jin_chunshui@yahoo.com.cn ;

计量

193nm薄膜激光诱导损伤研究

通讯作者: 金春水, Jin_chunshui@yahoo.com.cn;

作者简介: 常艳贺(1982-),男,硕士研究生,主要从事193nm薄膜技术的研究。

English Abstract

Study on laser induced damage of coating at 193nm

Corresponding author: JIN Chun-shui, Jin_chunshui@yahoo.com.cn

全文HTML

目录

留言板

193nm薄膜激光诱导损伤研究

作者简介: 常艳贺(1982-),男,硕士研究生,主要从事193nm薄膜技术的研究。.

通讯作者: 金春水, Jin_chunshui@yahoo.com.cn ;

Study on laser induced damage of coating at 193nm

Corresponding author: JIN Chun-shui, Jin_chunshui@yahoo.com.cn ;

计量

出版历程

193nm薄膜激光诱导损伤研究

通讯作者: 金春水, Jin_chunshui@yahoo.com.cn;

作者简介: 常艳贺(1982-),男,硕士研究生,主要从事193nm薄膜技术的研究。

English Abstract

Study on laser induced damage of coating at 193nm

Corresponding author: JIN Chun-shui, Jin_chunshui@yahoo.com.cn

全文HTML

目录