|
[1]
|
YUAN Z J, LOU Q H, ZHOU J, et al. Laser-induced crystallization of polycrystalline silicon thin films[J]. Laser Optoelectronics Progress,2007(11):52-57(in Chinese). |
|
[2]
|
VOUTSAS A T. A new era of crystallization:advances in polysilicon crystallization and crystal engineering[J]. Applied Surface Science,2003,208/209:250-262. |
|
[3]
|
YUAN Z J, LOU Q H, ZHOU J, et al. Flat-top green laser crystallization of amorphous silicon thin film[J]. Chinese Journal of Lasers,2009,36(1):205-209(in Chinese). |
|
[4]
|
DAO V A, HAN K M, HEO J K, et al. Fabrication of polycrystalline silicon thin films on glass substrates using fiber laser crystallization[J]. Thin Solid Films,2009,517(14):3971-3974. |
|
[5]
|
TSAI Ch Ch, LEE Y J, WANG J L, et al. High-performance top and bottom double-gate low-temperature poly-silicon thin film transistors fabricated by excimer laser crystallization[J]. Solid-State Electronics,2008,52(3):365-371. |
|
[6]
|
CHEN Y S, YANG S E, LU J X, et al. Microstructure of microcrystalline silicon film by plasma enhanced CVD[J]. Journal of Synthetic Crystals,2005,34(4): 753-759(in Chinese). |
|
[7]
|
REM J B, de LEUW M C V, HOLLEMAN J, et al. Furnace and rapid thermal crystallization of amorphous GexSi1-x and Si for thin film transistors[J]. Thin Solid Films,1997,296(1/2): 152-156. |
|
[8]
|
SINGH R,FAKHRUDDIN M,POOLE K F. Rapid photothermal processing as a semiconductor manufacturing technology for the 21st century[J]. Applied Surface Science,2000,168(1/4):198-203. |
|
[9]
|
TANG Zh X, SHEN H L, HUANG H B, et al. Preparation of high quality polycrystalline silicon thin films by aluminum-induced crystallization[J]. Thin Solid Films,2009,517(19): 5611-5615. |
|
[10]
|
KUO C C. Observation of explosive crystallization during excimer laser annealing using in situ time-resolved optical reflection and transmission measurements[J]. Journal of Materials Processing Technology,2009,209(6):2978-2985. |
|
[11]
|
MICHAUD J F, ROGEL R, MOHAMMED-BRAHIM T, et al. CW argon laser crystallization of silicon films: structural properties[J]. Journal of Non-Crystalline Solids,2006,352(9/20): 998-1002. |
|
[12]
|
ROSSI M C, SALVATORI S, BURCHIELLI M, et al. Optical and electrical properties of silicon nanocrystals formed by CW laser irradiation of amorphous silicon oxides[J]. Thin Solid Films,2001,383(1/2):267-270. |
|
[13]
|
PARK S J, KU Y M, KIM K H, et al. CW laser crystallization of amorphous silicon; dependence of amorphous silicon thickness and pattern width on the grain size[J]. Thin Solid Films,2006,511(7): 243 -247. |
|
[14]
|
XU E M, YUAN C, WANG J P, et al. In-situ raman spectroscopic study on the crystallization of amorphous silicon thin films with a 532nm continuous-wave laser[J]. Journal of Light Scattering,2008,20(3):258-264(in Chinese). |
|
[15]
|
CHEN J L,DUAN G P, HUANG M J. Influence of laser energy on average size of Si nanoparticles deposited in thin film[J].Laser Technology,2012,36(3):322-325(in Chinese). |
|
[16]
|
DUAN G P, CHEN J L, HAN J H, et al. Raman spectroscopic study of the crystallization of intrinsic amorphous silicon thin films with a 488nm continuous-wave laser[J].Acta Photonica Sinica,2011,40(11):1657-1661(in Chinese). |
|
[17]
|
TOET D, SMITH P M, SIGMON T W, et al. Laser crystallization and structural characterization of hydrogenated amorphous silicon thin films[J]. Journal of Applied Physics,1999, 85(11):7914-7917. |
|
[18]
|
MAVI H S, JAIN K P, SHUKLA A K, et al. Raman study of cw laser-induced crystallization of a-Si:H films on quartz and sapphire substrates[J]. Journal of Applied Physics,1991,69(6): 3696-3701. |
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