Study on laser induced damage of coating at 193nm

CHANG Yan-he; JIN Chun-shui; DENG Wen-yuan; LI Chun

doi:10.3969/j.issn.1001-3806.2011.03.006

Volume 35 Issue 3

May 2013

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Study on laser induced damage of coating at 193nm

1.
State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China;
2.
Graduate University, Chinese Academy of Sciences, Beijing 100039, China

Corresponding author: JIN Chun-shui, Jin_chunshui@yahoo.com.cn ;
Received Date: 2010-07-14
Accepted Date: 2010-08-10

Abstract

Research progress of laser induced damage of coating at 193nm was reviewed. After some typical damage morphologies from UV to DUV were compared, the possible reasons for the laser damage of the coating were put forward. The absorption of oxide coating at 193nm was responsible for the massive damage, while the damage of fluoride coating at 193nm was induced by local deposit defects. The dependence of the laser induced damage threshold on the thin film preparation parameters was known according to the damage analysis of the specimen. The methods to enhance the laser induced damage threshold were summarized by material chose, coating design and deposition process.
- thin films,
- 193nm,
- damage morphology,
- laser induced damage threshold

References

[1]	SONG D Y. Research status of deep ultraviolet lithography with 193nm excimer laser[J]. Laser Technology,1999,23(5):288-291(in Chinese).
[2]	XIE Ch Q,YE T Ch. 193nm optical lithography technique[J]. Microelectronic Technology,1999,27(4):9-12(in Chinese).
[3]	FAN Zh X,WEI Ch Y. Progress and development trends of optical coatings in high power laser[J]. Laser & Optoelectronics Progress,2009(7):14-17(in Chinese).
[4]	ULLMANN J,LAUTH H,MANN K,et al. Coated optics for DUV-excimer laser application[J]. SPIE,2000,3902:514-527.
[5]	SHANG Sh Zh,SHAO J D,FAN Zh X. Design of low loss 193nm HR mirror[J]. Optics and Precision Engineering,2008,16(3):392-397(in Chinese).
[6]	SHANG Sh Zh,SHAO J D,FAN Zh X. Low-loss 193nm anti-refection coatings[J]. Acta Physica Sinica,2008,57(3):1946-1950(in Chinese).
[7]	BECKER J,BERNHARDT A. ISO 11254,an international standard for the determination of the laser induced damage threshold[J]. SPIE,1994,2114:703-713.
[8]	ZHU Y N. Discussion of the measurement methods for laser induced damage threshold of optical coating[J]. Laser Technology,2006,30(5):532-535(in Chinese).
[9]	MANN K,LEINHOS U,SCHAFER B. Characterization of absorption losses in deep UV optical materials[J]. Proceedings of SPIE,2007,6403:64031J/1-64031J/10.
[10]	THIELSCH R,HEBER J,UHLIG H,et al. Optical,structural,and mechanical properties of gadolinium trifluoride thin films grown on amorphous substrates[J]. SPIE,2005,5963:211-222.
[11]	HEBER J,THIELSCH R,BLASCHKE H,et al. Stability of optical interference coatings exposed to low-fluence 193nm ArF radiation[J]. SPIE,1998,3334:1041-1047.
[12]	MIREILLE C,YVES N J,LAURENT G,et al. Optical characterization in laser damage studies[J]. Proceedings of SPIE,2007,6403:64031D/1-64031D/15.
[13]	DIJON J,QUESNEL E,PELLE C,et al. Laser damage of optical coating from UV to deep UV at 193nm[J]. SPIE,1998,3578:54-63.
[14]	APEL O,MANN K,THIELSCH R. Nonlinear absorption phenomena in oxide coatings for 193nm[J]. SPIE,2000,3902:235-241.
[15]	GUNSTER S,BLASCHKE H,RISTAU D. Laser resistivity of selected multilayer designs for DUV/VUV applications[J]. SPIE,2007,6403:640318/1-640318/8.
[16]	ZHANG D W,HE H B,SHAO J D,et al. Preparation of high power laser films based on ion beam assisted deposition[J]. Laser Technology,2008,32(1):57-60(in Chinese).
[17]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Microstructure of magnesium fluoride films deposited by boat evaporation at 193nm[J]. Applied Optics,2006,45(28):7319-7324.
[18]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Microstructure-related properties at 193nm of MgF2 and GdF3 films deposited by a resistive-heating boat[J]. Applied Optics,2006,45(7):1368-1374.
[19]	THIELSCH R,HEBER J,KAISER N. Critical issues on the assessment of laser induced damage thresholds of fluoride multilayer coatings at 193nm[J]. SPIE,2000,3902:224-234.
[20]	ZHAO Q,FAN Zh X. Damage mechanism of optical coatings and laser induced damage threshold of improvement[J]. Progress in High Power Laser Technology,1995,21(5):44-48(in Chinese).
[21]	RISTAU D,GUNSTER S,BOSCH S,et al. Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation[J]. Applied Optics,2002,41(16):3196-3204.
[22]	UHLIG H,THIELSCH R,HEBER J,et al. Lanthanide tri-fluorides:a survey of the optical,mechanical and structural properties of thin films with emphasis of their use in the DUV-VUV-spectral range[J]. Proceedings of SPIE,2005,5963:59630N/1-59630N/12.
[23]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Characterization of AlF3 thin films at 193nm by thermal evaporation[J]. Applied Optics,2005,44(34):7333-7338.
[24]	BISCHOFF M,GABLER D,KAISER N,et al. Optical and structural properties of LaF3 thin films[J]. Applied Optics,2008,47(13):157-161.
[25]	ABROMAVICIUS G,BUZELIS R,DRAZDYS R,et al. Influence of electric field distribution on laser induced damage threshold and morphology of high reflectance optical coatings[J]. SPIE,2007,6720:67200Y/1-67200Y/8.
[26]	GOTZELMAMM R,HAGEDORN H,ZOLLER A,et al. Oxide and fluoride coatings for the excimer wavelength 193nm[J]. Proceedings of SPIE,2005,5963:59630L/1-59630L/7.
[27]	BLASCHKE H,LAPPSCHIES M,RISTAU D. Performance enhancement of ion beam sputtered oxide coatings for 193nm[J]. Proceedings of SPIE,2008,6720:67200T/1-67200T/10.
[28]	TIAN J L,SHEN L,ZHANG Y D,et al. Research progress of deep-ultraviolet optical coatings[J]. Laser & Optoelectronics Progress,2009(3):50-56(in Chinese).
[29]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Microstructure and composition related characteristics of LaF3 thin films at 193nm[J]. Optical Engineering,2006,45(8):0838011-0838016.
[30]	TAKI Y. Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography[J]. Vacuum,2004,74(3/4):431-435.

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通讯作者: 陈斌, bchen63@163.com

1.
沈阳化工大学材料科学与工程学院沈阳 110142

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Study on laser induced damage of coating at 193nm

Corresponding author: JIN Chun-shui, Jin_chunshui@yahoo.com.cn;

1. State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China;

2. Graduate University, Chinese Academy of Sciences, Beijing 100039, China

Received Date: 2010-07-14

Accepted Date: 2010-08-10

Available Online: 2011-05-25

Abstract: Research progress of laser induced damage of coating at 193nm was reviewed. After some typical damage morphologies from UV to DUV were compared, the possible reasons for the laser damage of the coating were put forward. The absorption of oxide coating at 193nm was responsible for the massive damage, while the damage of fluoride coating at 193nm was induced by local deposit defects. The dependence of the laser induced damage threshold on the thin film preparation parameters was known according to the damage analysis of the specimen. The methods to enhance the laser induced damage threshold were summarized by material chose, coating design and deposition process.

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Reference (30)

[1]	SONG D Y. Research status of deep ultraviolet lithography with 193nm excimer laser[J]. Laser Technology,1999,23(5):288-291(in Chinese).
[2]	XIE Ch Q,YE T Ch. 193nm optical lithography technique[J]. Microelectronic Technology,1999,27(4):9-12(in Chinese).
[3]	FAN Zh X,WEI Ch Y. Progress and development trends of optical coatings in high power laser[J]. Laser & Optoelectronics Progress,2009(7):14-17(in Chinese).
[4]	ULLMANN J,LAUTH H,MANN K,et al. Coated optics for DUV-excimer laser application[J]. SPIE,2000,3902:514-527.
[5]	SHANG Sh Zh,SHAO J D,FAN Zh X. Design of low loss 193nm HR mirror[J]. Optics and Precision Engineering,2008,16(3):392-397(in Chinese).
[6]	SHANG Sh Zh,SHAO J D,FAN Zh X. Low-loss 193nm anti-refection coatings[J]. Acta Physica Sinica,2008,57(3):1946-1950(in Chinese).
[7]	BECKER J,BERNHARDT A. ISO 11254,an international standard for the determination of the laser induced damage threshold[J]. SPIE,1994,2114:703-713.
[8]	ZHU Y N. Discussion of the measurement methods for laser induced damage threshold of optical coating[J]. Laser Technology,2006,30(5):532-535(in Chinese).
[9]	MANN K,LEINHOS U,SCHAFER B. Characterization of absorption losses in deep UV optical materials[J]. Proceedings of SPIE,2007,6403:64031J/1-64031J/10.
[10]	THIELSCH R,HEBER J,UHLIG H,et al. Optical,structural,and mechanical properties of gadolinium trifluoride thin films grown on amorphous substrates[J]. SPIE,2005,5963:211-222.
[11]	HEBER J,THIELSCH R,BLASCHKE H,et al. Stability of optical interference coatings exposed to low-fluence 193nm ArF radiation[J]. SPIE,1998,3334:1041-1047.
[12]	MIREILLE C,YVES N J,LAURENT G,et al. Optical characterization in laser damage studies[J]. Proceedings of SPIE,2007,6403:64031D/1-64031D/15.
[13]	DIJON J,QUESNEL E,PELLE C,et al. Laser damage of optical coating from UV to deep UV at 193nm[J]. SPIE,1998,3578:54-63.
[14]	APEL O,MANN K,THIELSCH R. Nonlinear absorption phenomena in oxide coatings for 193nm[J]. SPIE,2000,3902:235-241.
[15]	GUNSTER S,BLASCHKE H,RISTAU D. Laser resistivity of selected multilayer designs for DUV/VUV applications[J]. SPIE,2007,6403:640318/1-640318/8.
[16]	ZHANG D W,HE H B,SHAO J D,et al. Preparation of high power laser films based on ion beam assisted deposition[J]. Laser Technology,2008,32(1):57-60(in Chinese).
[17]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Microstructure of magnesium fluoride films deposited by boat evaporation at 193nm[J]. Applied Optics,2006,45(28):7319-7324.
[18]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Microstructure-related properties at 193nm of MgF2 and GdF3 films deposited by a resistive-heating boat[J]. Applied Optics,2006,45(7):1368-1374.
[19]	THIELSCH R,HEBER J,KAISER N. Critical issues on the assessment of laser induced damage thresholds of fluoride multilayer coatings at 193nm[J]. SPIE,2000,3902:224-234.
[20]	ZHAO Q,FAN Zh X. Damage mechanism of optical coatings and laser induced damage threshold of improvement[J]. Progress in High Power Laser Technology,1995,21(5):44-48(in Chinese).
[21]	RISTAU D,GUNSTER S,BOSCH S,et al. Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation[J]. Applied Optics,2002,41(16):3196-3204.
[22]	UHLIG H,THIELSCH R,HEBER J,et al. Lanthanide tri-fluorides:a survey of the optical,mechanical and structural properties of thin films with emphasis of their use in the DUV-VUV-spectral range[J]. Proceedings of SPIE,2005,5963:59630N/1-59630N/12.
[23]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Characterization of AlF3 thin films at 193nm by thermal evaporation[J]. Applied Optics,2005,44(34):7333-7338.
[24]	BISCHOFF M,GABLER D,KAISER N,et al. Optical and structural properties of LaF3 thin films[J]. Applied Optics,2008,47(13):157-161.
[25]	ABROMAVICIUS G,BUZELIS R,DRAZDYS R,et al. Influence of electric field distribution on laser induced damage threshold and morphology of high reflectance optical coatings[J]. SPIE,2007,6720:67200Y/1-67200Y/8.
[26]	GOTZELMAMM R,HAGEDORN H,ZOLLER A,et al. Oxide and fluoride coatings for the excimer wavelength 193nm[J]. Proceedings of SPIE,2005,5963:59630L/1-59630L/7.
[27]	BLASCHKE H,LAPPSCHIES M,RISTAU D. Performance enhancement of ion beam sputtered oxide coatings for 193nm[J]. Proceedings of SPIE,2008,6720:67200T/1-67200T/10.
[28]	TIAN J L,SHEN L,ZHANG Y D,et al. Research progress of deep-ultraviolet optical coatings[J]. Laser & Optoelectronics Progress,2009(3):50-56(in Chinese).
[29]	LIU M Ch,LEE Ch Ch,KANEKO M,et al. Microstructure and composition related characteristics of LaF3 thin films at 193nm[J]. Optical Engineering,2006,45(8):0838011-0838016.
[30]	TAKI Y. Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography[J]. Vacuum,2004,74(3/4):431-435.

Study on laser induced damage of coating at 193nm

Abstract

References

Proportional views

通讯作者: 陈斌, bchen63@163.com

Proportional views