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Sep. 2013

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Article Navigation > LASER TECHNOLOGY > 1982 > 6(6): 37-41,45

Citation:

[1]	J,O.S,A.,1977, Vol.67, P.1430.
[2]	Appl.Opt.,1971,Vol.10, No.12,P.2658.
[3]	Appl.Opt.,1976, Vol.15, No.12, P.2968.
[4]	苏家驹,电子束镀膜时荷电粒子对薄膜质量的影响,待发表.
[5]	Thin Solid Films, 1980, Vol.70,No.1,P.43.
[6]	Rev.Scient,Instrum.,1969,Vo1,40,No.R.P.1054.
[7]	光学工程,1978年,3月.
[8]	Thin Solid Films, 1976, Vol.34, P.363.
[9]	Reactive evaporation of hard SiO2/TiO2 maltflayers,北京815薄膜座谈会议资料(西德).
[10]	Apll.Opt.,1973, Vol.12,No.4.