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Volume 14 Issue 1
Sep.  2013
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A coating method of destroying the column structure of the thin films：computer simulation and analysis of the mechanism

  • 1.

    Harbin Institute of Technology

  • Received Date: 1989-09-04
  • A method based on changing the depositing angle constinously in the range of 0°～180°has been proposed,by which the typical column structure of the vapor depositing coating is destroied,therefore the depositing films have the structure as that of the bulk materials.The growthing formula are given in this thesis.And the microstructure of the thin fihns in this case has simulately computer by computer.At the same time,the mechanism of the better characters due to this structure has been analysed.
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  • [1]

    J.M.Pearson,Thin Solid Films,1970,Vol.6,P.349-358.
    [2]

    H.A.Macleod et al.,J.Vac Sci.Techn.,1986,Vol.A4,No.3,P.418.
    [3]

    A,G,Dirks,H.d.Leamy,Thin Solid Films,1977.Vol.47,P.219.
    [4]

    H.K,Pulker et al.,Thin Solid Films,1971,Vol.9,P.57.
    [5]

    S.Ogura,Some Features of the Behaviaur of Optical Thin Films,Ph.D.Theis,Newcastale upon Tyne Polytechnic,1975.
    [6]

    M.Harris et al.,Thin Solid Films,1979,Vol.57,P.173-178.
    [7] 张伟等,《激光技术》,1989,Vol.13,No.3,P.35-39.
    [8]

    John R.Gee et al.,Appl.Opt.,1985,Vol.24,No.19,P.3188-3192.
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A coating method of destroying the column structure of the thin films：computer simulation and analysis of the mechanism

  • 1. Harbin Institute of Technology
  • Received Date: 1989-09-04
  • Available Online: 1990-01-25

Abstract: A method based on changing the depositing angle constinously in the range of 0°～180°has been proposed,by which the typical column structure of the vapor depositing coating is destroied,therefore the depositing films have the structure as that of the bulk materials.The growthing formula are given in this thesis.And the microstructure of the thin fihns in this case has simulately computer by computer.At the same time,the mechanism of the better characters due to this structure has been analysed.

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