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Volume 28 Issue 4
Sep.  2013
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Article Navigation >  LASER TECHNOLOGY  > 2004 >  28(4): 434-437,448

Citation:
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Dynamic model of a new XeCl laser with short duration time and UV grow discharge system design

  • 1.

    Department of Physics, Xi'an Jiaotong University, Xi'an 710049, China;

  • 2.

    Department of Applied Physics, Northwes-tern Polytechnical University, Xi'an 710072, China;

  • 3.

    Department of Information & Communication, Xi'an Jiaotong University, Xi'an 710049, China

  • Received Date: 2003-08-27
    Accepted Date: 2004-02-04
  • A new high power,short duration time XeCl laser is realized in order to prepare microstructure of quantum effect,depositing film,molecular beam epitaxy and analysis of output pulse profiles. It adopts the method of glow discharged,the calculation of dynamic equation,the analysis velocity reaction and density of XeCl laser,and UV preionization. In the addition,the parameters of the laser are also measured. The results are wavelength 308nm,the pulse duration time 18ns,the pulse energy 450mJ and the beam divergence angle 3mrad. It is shown that the proposed glow discharged is realized,the dynamic equation model of laser is correct,and the laser has high efficiency to produce the vapor plasma plume.It can be applied in the interaction between laser and material,material plasma study.
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  • [1]

    MARTINO M,LUCHES A,FERNANDEZ M.Characterization of thin indium tin oxide films deposited by pulsed XeCl laser ablation [J].Appl Phys,2001,34 (17):2606～2609.
    [2]

    SKAKUN V S,LOMAEV M I,TARASENKO V F.KrCl and XeCl exciplex glow discharge lamps with an output power of similar to 1.5kW [J].Tech Phys Lett,2002,28(11):899～801.
    [3]

    BERRY G A.On the long pulse operation of an X-ray preionzed gas discharge pumped ArF excimer laser [J].A P L,1999,75:23～24.
    [4]

    ITO S.Continuous operation up to 3kHz in a discharge-pumped XeCl excimer laser [J].Appl Phys,1996,63(1):1～7.
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  • 1. 

    沈阳化工大学材料科学与工程学院 沈阳 110142

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Dynamic model of a new XeCl laser with short duration time and UV grow discharge system design

  • 1. Department of Physics, Xi'an Jiaotong University, Xi'an 710049, China;
  • 2. Department of Applied Physics, Northwes-tern Polytechnical University, Xi'an 710072, China;
  • 3. Department of Information & Communication, Xi'an Jiaotong University, Xi'an 710049, China
  • Received Date: 2003-08-27
  • Accepted Date: 2004-02-04
  • Available Online: 2004-07-25

Abstract: A new high power,short duration time XeCl laser is realized in order to prepare microstructure of quantum effect,depositing film,molecular beam epitaxy and analysis of output pulse profiles. It adopts the method of glow discharged,the calculation of dynamic equation,the analysis velocity reaction and density of XeCl laser,and UV preionization. In the addition,the parameters of the laser are also measured. The results are wavelength 308nm,the pulse duration time 18ns,the pulse energy 450mJ and the beam divergence angle 3mrad. It is shown that the proposed glow discharged is realized,the dynamic equation model of laser is correct,and the laser has high efficiency to produce the vapor plasma plume.It can be applied in the interaction between laser and material,material plasma study.

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