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Volume 30 Issue 3
Sep.  2013
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Uniformity test of the local optical thickness for GaN-based material

  • Corresponding author: CHEN Gui-bin, gbchen@mai.lsitp.ac.cn
  • Received Date: 2005-02-28
    Accepted Date: 2005-10-24
  • Based on the interference signal in the micro-photoluminescence(μ-PL) spectra,a practical method of getting local optical thickness for GaN-based material is presented.By means of analyzing the sequence energy of interference peaks,the optical thickness of the GaN-based films can be determined.The non-uniformity of the fitted parameter can correspondingly show that of the optical thickness.This can give the important information for optimizing the material growth technique.
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    LI Z Q,CHEN H,LIU H F et al.Photoluminescence study of Si doping cubic GaN grown on (001) GaAs substrates by MBE[J].J Crystal Growth,2001,227~228:420~424.
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    沈阳化工大学材料科学与工程学院 沈阳 110142

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Uniformity test of the local optical thickness for GaN-based material

    Corresponding author: CHEN Gui-bin, gbchen@mai.lsitp.ac.cn
  • 1. Jiangsu Key Laboratory for Chemistry of Low Dimensional Material, Department of Physics, Huaiyin Teachers College, Huaiyin 223001, China;
  • 2. National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, the Chinese Academy of Sc

Abstract: Based on the interference signal in the micro-photoluminescence(μ-PL) spectra,a practical method of getting local optical thickness for GaN-based material is presented.By means of analyzing the sequence energy of interference peaks,the optical thickness of the GaN-based films can be determined.The non-uniformity of the fitted parameter can correspondingly show that of the optical thickness.This can give the important information for optimizing the material growth technique.

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