氧化物光学薄膜的压入硬度研究

Indent hardness of optical oxide films

摘要: 为了评价离子源辅助对不同氧化物薄膜的影响, 采用不同的镀膜设备沉积了TiO₂、Ta₂O₅、ZrO₂、SiO₂氧化物单层膜, 用椭偏仪测量了其折射率和厚度, 并用纳米压痕仪测量了不同载荷下材料的杨氏模量和纳米硬度, 比较了不同离子源沉积条件下膜层这两个参数的变化。结果表明, 离子源辅助能有效增加膜层杨氏模量和压入硬度, TiO₂增加了2 GPa, Ta₂O₅增加了4 GPa, ZrO₂增加了2 GPa, 和膜层的折射率变化趋势是一致的。纳米压痕法也可作为评价离子源轰击能力的一种手段。

Abstract: To evaluate the effect of ion source assistance on different oxide films, TiO₂, Ta₂O₅, ZrO₂ and SiO₂ were deposited with different radio frequency(RF) sources. The index and thickness were measured by a spectroscopic ellipsometer. The Young's module and the hardness of these films were compared. Experiments show that the value of Young's module and hardness are increased, 2 GPa for TiO₂, 4 GPa for Ta₂O₅, 2 GPa for ZrO₂, in accordance with the film index. The nano-indention method is effective in evaluating the ability of ion sources.