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面发射激光器的高速性能研究

Exploration of characteristics of high-speed surface emitting lasers

  • 摘要: 为了简化工艺,提高面发射激光器的调制带宽与数据传输速率,采用多量子阱有源区设计、介质平面化工艺制备、氧化约束限制等方法,制备了一种发射波长为850 nm的垂直腔面发射激光器(VCSEL)。工艺上采用低介电常数的聚酰亚胺(PI)进行平面化,而非高速VCSEL芯片上常用的苯并环丁烯, 研究了基于PI胶平面化工艺的高速器件的寄生响应。结果表明,在低偏置电流下,具有3 μm氧化孔径的VCSEL显示出最大调制带宽为25.2 GHz,谐振频率为24.3 GHz,寄生截止频率为13.2 GHz,调制电流效率因子为22.726 GHz/mA1/2, D因子为19.670 GHz/mA1/2,阈值电流和微分电阻分别达到0.27 mA和215.965 Ω,最大光输出功率为0.9 mW; PI方案可用于调制带宽为25 GHz及以下的产品。这一结果对简化工艺、提高面发射激光器的数据传输速率具有一定的指导意义。

     

    Abstract: In order to simplify the process, and to improve the modulation bandwidth and data transmission rate of surface emitting lasers, a vertical cavity surface emitting laser (VCSEL) with an emission wavelength of 850 nm was prepared using methods such as multi quantum well active region design, medium planarization process preparation, and oxidation constraint limitation. Low dielectric constant polyimide (PI) was used for planarization in the process, instead of the commonly used benzocyclobutene on high-speed VCSEL chips. The parasitic response of high-speed devices based on PI glue planarization process was studied. The experimental results indicate that, at low bias current, the VCSEL with 3 μm oxide aperture shows a maximum modulation bandwidth of 25.2 GHz, resonant frequency of 24.3 GHz, parasitic cutoff frequency of 13.2 GHz, modulation current efficiency factor of 22.726 GHz/mA1/2, D factor of 19.670 GHz/mA1/2, threshold current and differential resistance of 0.27 mA and 215.965 Ω, respectively, and maximum optical output power of 0.9 mW. The PI scheme can be used to modulate products with a bandwidth of 25 GHz and below. This result has certain guiding significance for simplifying the process and improving the data transmission rate of surface emitting lasers.

     

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