Abstract: A 13.5 nm extreme ultraviolet light source produced by the laser driven plasma is used in today's most advanced lithography machines and chip manufacturing. Generally, a 10.6 μm CO₂ gas laser is the driving light of commercial extreme ultraviolet lithography. In the future, solid-state lasers are expected to become a new generation of driving light sources due to their high plug efficiency and strong output power/energy scalability. The physical process of laser-plasma interaction for producing extreme ultraviolet light was summarized. The research progress of 10.6 μm CO₂ gas laser 1 μm and 2 μm solid-state lasers in driving plasma to produce extreme ultraviolet light and optical system was reviewed. The advantages of 1 μm and 2 μm solid-state lasers as driving light sources were emphatically discussed. On this basis, the research prospect of infrared laser driven extreme ultraviolet lithography source is prospected.